Assignee
LEE WAI MUN
US·10 granted patents·10 pending applications·55 citations·filing 2008–2012
Top patents by PatentIndex Score
20 records- 0193US8062429B2Methods of cleaning semiconductor devices at the back end of line using amidoxime compositionsLEE WAI MUN·Filed 2008·Granted Nov 22, 2011·23 cites·18 claims
- 0291US8148310B2Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acidLEE WAI MUN·Filed 2010·Granted Apr 3, 2012·11 cites·9 claims
- 0385US8173584B2Composition and method for treating semiconductor substrate surfaceLEE WAI MUN·Filed 2011·Granted May 8, 2012·6 cites·9 claims
- 0485US7947130B2Troika acid semiconductor cleaning compositions and methods of useLEE WAI MUN·Filed 2010·Granted May 24, 2011·6 cites·10 claims
- 0581US8658583B2Method for making a photoresist stripping solution comprising an organic sulfonic acid and an organic hydrocarbon solventLEE WAI MUN·Filed 2009·Granted Feb 25, 2014·5 cites·17 claims
- 0680US8148311B2Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acidLEE WAI MUN·Filed 2011·Granted Apr 3, 2012·3 cites·16 claims
- 0771US8431516B2Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acidLEE WAI MUN·Filed 2012·Granted Apr 30, 2013·1 cites·19 claims
- 0858US2009137191A1Copper cmp polishing pad cleaning composition comprising of amidoxime compoundsLEE WAI MUN·Filed 2008·Application pending·0 cites
- 0955US2009112024A1Stabilization of hydroxylamine containing solutions and method for their preparationLEE WAI MUN·Filed 2008·Application pending·0 cites
- 1055US2009111965A1Novel nitrile and amidoxime compounds and methods of preparationLEE WAI MUN·Filed 2008·Application pending·0 cites
- 1154US2009107520A1Amidoxime compounds as chelating agents in semiconductor processesLEE WAI MUN·Filed 2008·Application pending·0 cites
- 1253US8303839B2Trioka acid semiconductor cleaning compositions and methods of useLEE WAI MUN·Filed 2011·Granted Nov 6, 2012·0 cites·8 claims
- 1351US2011247660A1Photoresist stripping solutionLEE WAI MUN·Filed 2011·Application pending·0 cites
- 1450US2011146724A1Photoresist stripping solutionsLEE WAI MUN·Filed 2010·Application pending·0 cites
- 1548US2010105595A1Composition comprising chelating agents containing amidoxime compoundsLEE WAI MUN·Filed 2008·Application pending·0 cites
- 1648US2009130849A1Chemical mechanical polishing and wafer cleaning composition comprising amidoxime compounds and associated method for useLEE WAI MUN·Filed 2008·Application pending·0 cites
- 1748US2009133716A1Methods of post chemical mechanical polishing and wafer cleaning using amidoxime compositionsLEE WAI MUN·Filed 2008·Application pending·0 cites
- 1847US8101561B2Composition and method for treating semiconductor substrate surfaceLEE WAI MUN·Filed 2010·Granted Jan 24, 2012·0 cites·11 claims
- 1946US2011065622A1Novel nitrile and amidoxime compounds and methods of preparation for semiconductor processingLEE WAI MUN·Filed 2010·Application pending·0 cites
- 2045US8802609B2Nitrile and amidoxime compounds and methods of preparation for semiconductor processingLEE WAI MUN·Filed 2012·Granted Aug 12, 2014·0 cites·12 claims
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