Assignee
LEICA MICROSYS LITHOGRAPHY LTD
GB·20 granted patents·3 pending applications·166 citations·filing 1993–2006
Top patents by PatentIndex Score
23 records- 0186US7241542B2Process for controlling the proximity effect correctionLEICA MICROSYS LITHOGRAPHY LTD·Filed 2005·Granted Jul 10, 2007·11 cites·17 claims
- 0279US7332730B2Device and method for imaging a multiple particle beam on a substrateLEICA MICROSYS LITHOGRAPHY LTD·Filed 2005·Granted Feb 19, 2008·9 cites·30 claims
- 0374US6639225B2Six-axis positioning system having a zero-magnetic-field spaceLEICA MICROSYS LITHOGRAPHY LTD·Filed 2001·Granted Oct 28, 2003·27 cites·12 claims
- 0462US5998795AElectron beam pattern-writing columnLEICA MICROSYS LITHOGRAPHY LTD·Filed 1996·Granted Dec 7, 1999·17 cites·11 claims
- 0560US6600162B1Method and device for exposing a substrate to lightLEICA MICROSYS LITHOGRAPHY LTD·Filed 1999·Granted Jul 29, 2003·18 cites·15 claims
- 0657US6635884B2Method for directing an electron beam onto a target position on a substrate surfaceLEICA MICROSYS LITHOGRAPHY LTD·Filed 2001·Granted Oct 21, 2003·7 cites·6 claims
- 0756US6128364ACondenser-monochromator arrangement for X-radiationLEICA MICROSYS LITHOGRAPHY LTD·Filed 1997·Granted Oct 3, 2000·24 cites·11 claims
- 0854US6774375B2Method and apparatus for forming a curved polyline on a radiation-sensitive resistLEICA MICROSYS LITHOGRAPHY LTD·Filed 2001·Granted Aug 10, 2004·4 cites·16 claims
- 0953US7019308B2Thermal compensation in magnetic field influencing of an electron beamLEICA MICROSYS LITHOGRAPHY LTD·Filed 2004·Granted Mar 28, 2006·2 cites·27 claims
- 1053US6635395B2Method for exposing a layout comprising multiple layers on a waferLEICA MICROSYS LITHOGRAPHY LTD·Filed 2001·Granted Oct 21, 2003·6 cites·9 claims
- 1150US6998621B2Cooling of a device for influencing an electron beamLEICA MICROSYS LITHOGRAPHY LTD·Filed 2004·Granted Feb 14, 2006·2 cites·23 claims
- 1250US6781140B1Method of and machine for pattern writing by an electron beamLEICA MICROSYS LITHOGRAPHY LTD·Filed 2000·Granted Aug 24, 2004·6 cites·30 claims
- 1349US6376850B1Electron beam aperture elementLEICA MICROSYS LITHOGRAPHY LTD·Filed 1998·Granted Apr 23, 2002·8 cites·13 claims
- 1448US6541776B1Device for electrostatic deflection of a particle beamLEICA MICROSYS LITHOGRAPHY LTD·Filed 2000·Granted Apr 1, 2003·2 cites·12 claims
- 1546US7783377B2Substrate loading and unloading apparatusLEICA MICROSYS LITHOGRAPHY LTD·Filed 2003·Granted Aug 24, 2010·2 cites·53 claims
- 1646US5879860AMethod of writing a pattern by an electron beamLEICA MICROSYS LITHOGRAPHY LTD·Filed 1993·Granted Mar 9, 1999·11 cites·12 claims
- 1743US7053388B2Dual-mode electron beam lithography machineLEICA MICROSYS LITHOGRAPHY LTD·Filed 2004·Granted May 30, 2006·1 cites·16 claims
- 1842US7491946B2Electrostatic deflection system for corpuscular radiationLEICA MICROSYS LITHOGRAPHY LTD·Filed 2006·Granted Feb 17, 2009·0 cites·21 claims
- 1942US2005073203A1Stage for a workpieceLEICA MICROSYS LITHOGRAPHY LTD·Filed 2004·Application pending·0 cites
- 2037US6885009B2Device for influencing an electron beamLEICA MICROSYS LITHOGRAPHY LTD·Filed 2003·Granted Apr 26, 2005·2 cites·11 claims
- 2136US6426860B1Holding device for a substrateLEICA MICROSYS LITHOGRAPHY LTD·Filed 1999·Granted Jul 30, 2002·7 cites·16 claims
- 2235US2005035308A1Pattern writing equipmentLEICA MICROSYS LITHOGRAPHY LTD·Filed 2004·Application pending·0 cites
- 2331US2006121396A1Method for exposing a substrate with a beamLEICA MICROSYS LITHOGRAPHY LTD·Filed 2005·Application pending·0 cites
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