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LIN QIN
US3 patents
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US9640396B2May 2, 2017
Spin-on spacer materials for double- and triple-patterning lithography
LIN QIN13 citations81
US8836082B2Sep 16, 2014
Reversal lithography approach by selective deposition of nanoparticles
LIN QIN5 citations71
US8808969B2Aug 19, 2014
Method of making radiation-sensitive sol-gel materials
LIN QIN1 citations50