Assignee
MAEDA KATSUMI
JP·4 granted patents·5 pending applications·0 citations·filing 2008–2012
Top patents by PatentIndex Score
9 records- 0160US8802798B2(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itMAEDA KATSUMI·Filed 2008·Granted Aug 12, 2014·0 cites·5 claims
- 0256US2012178023A1(meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using itMAEDA KATSUMI·Filed 2011·Application pending·0 cites
- 0352US8414733B2Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguideMAEDA KATSUMI·Filed 2010·Granted Apr 9, 2013·0 cites·8 claims
- 0444US9012773B2Thiazole-based compound and uses thereofMAEDA KATSUMI·Filed 2012·Granted Apr 21, 2015·0 cites·19 claims
- 0543US8933329B2Maleimide-based compound, and tautomer or stereoisomer thereof, dye for photoelectric conversion, and semiconductor electrode, photoelectric conversion element and photoelectrochemical cell using the sameMAEDA KATSUMI·Filed 2011·Granted Jan 13, 2015·0 cites·9 claims
- 0638US2013167932A1Indole compound, and photoelectric conversion dye using same, semiconductor electrode, photoelectric conversion element, and photoelectrochemical cellMAEDA KATSUMI·Filed 2011·Application pending·0 cites
- 0738US2013118570A1Dye for photoelectric conversion, semiconductor electrode, photoelectric conversion element, solar cell, and novel pyrroline-based compoundMAEDA KATSUMI·Filed 2010·Application pending·0 cites
- 0836US2012021357A1Positive-type photosensitive insulating resin composition, and pattern forming method using sameMAEDA KATSUMI·Filed 2010·Application pending·0 cites
- 0935US2011281217A1Negative photosensitive insulating resin composition and method for patterning using the sameMAEDA KATSUMI·Filed 2010·Application pending·0 cites
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