Assignee
MAKAROV VLADIMIR V
US·4 granted patents·2 pending applications·9 citations·filing 2009–2012
Top patents by PatentIndex Score
6 records- 0175US8277672B2Enhanced focused ion beam etching of dielectrics and siliconMAKAROV VLADIMIR V·Filed 2009·Granted Oct 2, 2012·5 cites·8 claims
- 0274US8481966B1Microplasma ion source for focused ion beam applicationsMAKAROV VLADIMIR V·Filed 2012·Granted Jul 9, 2013·3 cites·19 claims
- 0363US8674321B2Microplasma ion source for focused ion beam applicationsMAKAROV VLADIMIR V·Filed 2012·Granted Mar 18, 2014·1 cites·7 claims
- 0447US8894828B2FIB process for selective and clean etching of copperMAKAROV VLADIMIR V·Filed 2010·Granted Nov 25, 2014·0 cites·18 claims
- 0547US2011048929A1FIB Process for Selective and Clean Etching of CopperMAKAROV VLADIMIR V·Filed 2009·Application pending·0 cites
- 0643US2011048931A1FIB Process for Selective and Clean Etching of CopperMAKAROV VLADIMIR V·Filed 2010·Application pending·0 cites
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