Assignee
MARAKHTANOV ALEXEI
US·8 granted patents·3 pending applications·14 citations·filing 2008–2012
Top patents by PatentIndex Score
11 records- 0177US9396908B2Systems and methods for controlling a plasma edge regionMARAKHTANOV ALEXEI·Filed 2011·Granted Jul 19, 2016·3 cites·12 claims
- 0276US9287096B2Methods and apparatus for a hybrid capacitively-coupled and an inductively-coupled plasma processing systemMARAKHTANOV ALEXEI·Filed 2008·Granted Mar 15, 2016·3 cites·19 claims
- 0374US8222157B2Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereofMARAKHTANOV ALEXEI·Filed 2010·Granted Jul 17, 2012·4 cites·13 claims
- 0467US8872525B2System, method and apparatus for detecting DC bias in a plasma processing chamberMARAKHTANOV ALEXEI·Filed 2011·Granted Oct 28, 2014·2 cites·19 claims
- 0561US8154209B2Modulated multi-frequency processing methodMARAKHTANOV ALEXEI·Filed 2009·Granted Apr 10, 2012·2 cites·20 claims
- 0652US2013059448A1Pulsed Plasma Chamber in Dual Chamber ConfigurationMARAKHTANOV ALEXEI·Filed 2011·Application pending·0 cites
- 0750US9263240B2Dual zone temperature control of upper electrodesMARAKHTANOV ALEXEI·Filed 2012·Granted Feb 16, 2016·0 cites·10 claims
- 0848US2017213734A9Multifrequency capacitively coupled plasma etch chamberMARAKHTANOV ALEXEI·Filed 2009·Application pending·0 cites
- 0947US9245720B2Methods and apparatus for detecting azimuthal non-uniformity in a plasma processing systemMARAKHTANOV ALEXEI·Filed 2012·Granted Jan 26, 2016·0 cites·10 claims
- 1046US9337004B2Grounded confinement ring having large surface areaMARAKHTANOV ALEXEI·Filed 2009·Granted May 10, 2016·0 cites·14 claims
- 1142US2013122711A1System, method and apparatus for plasma sheath voltage controlMARAKHTANOV ALEXEI·Filed 2011·Application pending·0 cites
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