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MATSUI HIROYUKI

JP4 patents

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US9202665B2Dec 1, 2015

Charged particle beam apparatus for removing charges developed on a region of a sample

MATSUI HIROYUKI5 citations71
US8490857B2Jul 23, 2013

Reflow apparatus, a reflow method, and a manufacturing method of a semiconductor device

MATSUI HIROYUKI2 citations61
US8302843B2Nov 6, 2012

Process for producing semiconductor device and apparatus therefor

MATSUI HIROYUKI2 citations61
US8336756B2Dec 25, 2012

Reflow apparatus, a reflow method, and a manufacturing method of semiconductor device

MATSUI HIROYUKI0 citations51