Assignee
MINAMIDE AYUMI
JP3 patents
Top patents by PatentIndex Score
US8563200B2Oct 22, 2013
Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device
MINAMIDE AYUMI0 citations48
US8119308B2Feb 21, 2012
Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask
MINAMIDE AYUMI1 citations47
US8426087B2Apr 23, 2013
Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method
MINAMIDE AYUMI0 citations35