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JP9 patents

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US8532395B2Sep 10, 2013

Pattern inspection method and semiconductor device manufacturing method

MITSUI TADASHI9 citations83
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Image processing apparatus, image processing method, defect detection method, semiconductor device manufacturing method, and program

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Pattern measurement apparatus and pattern measurement method

MITSUI TADASHI4 citations62
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Pattern misalignment measurement method, program, and semiconductor device manufacturing method

MITSUI TADASHI2 citations62
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Pattern evaluation method, pattern matching method and computer readable medium

MITSUI TADASHI2 citations62
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Defect inspection apparatus and defect inspection method

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Pattern evaluation method, computer-readable recording medium, and manufacturing method of semiconductor device

MITSUI TADASHI0 citations51
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Pattern defect inspection using data based on secondary electron from pattern

MITSUI TADASHI0 citations41
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Pattern shape evaluation method, program, and semiconductor device manufacturing method

MITSUI TADASHI0 citations41