Assignee
MIZUMURA MICHINOBU
JP·11 granted patents·22 citations·filing 2011–2012
Top patents by PatentIndex Score
11 records- 0196US9063376B2Exposure device of an alignment material filmMIZUMURA MICHINOBU·Filed 2011·Granted Jun 23, 2015·19 cites·16 claims
- 0274US8854600B2Exposure apparatus and photomaskMIZUMURA MICHINOBU·Filed 2011·Granted Oct 7, 2014·3 cites·5 claims
- 0345US9122171B2Exposure apparatusMIZUMURA MICHINOBU·Filed 2012·Granted Sep 1, 2015·0 cites·10 claims
- 0445US9069251B2Scanning exposure apparatus using a plurality of microlens arrays with adjustable inclinationMIZUMURA MICHINOBU·Filed 2011·Granted Jun 30, 2015·0 cites·7 claims
- 0545US9001425B2Microlens array and scanning exposure device using sameMIZUMURA MICHINOBU·Filed 2012·Granted Apr 7, 2015·0 cites·6 claims
- 0644US9121986B2Microlens array and scanning exposure device using sameMIZUMURA MICHINOBU·Filed 2012·Granted Sep 1, 2015·0 cites·17 claims
- 0743US9429852B2Microlens exposure systemMIZUMURA MICHINOBU·Filed 2011·Granted Aug 30, 2016·0 cites·18 claims
- 0843US9152057B2Scanning exposure apparatus using microlens arrayMIZUMURA MICHINOBU·Filed 2011·Granted Oct 6, 2015·0 cites·5 claims
- 0943US9030646B2Exposure apparatus and photomask used thereinMIZUMURA MICHINOBU·Filed 2012·Granted May 12, 2015·0 cites·6 claims
- 1040US9304391B2Exposure apparatus using microlens array and optical memberMIZUMURA MICHINOBU·Filed 2011·Granted Apr 5, 2016·0 cites·7 claims
- 1132US8953146B2Exposure apparatus for improving alignment accuracy of a pattern generated by light modulating elementsMIZUMURA MICHINOBU·Filed 2011·Granted Feb 10, 2015·0 cites·4 claims
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