Assignee

MUHAMMAD AMIN SALEEM

SE·1 granted patent·0 citations·filing 2009–2009

Technology mixB82Y1 G03F1 H10P1 Y10S1

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0120US9028242B2Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscaleMUHAMMAD AMIN SALEEM·Filed 2009·Granted May 12, 2015·0 cites·12 claims

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