Assignee
NAKAHARA KAZUO
JP·4 granted patents·5 citations·filing 2011–2012
Top patents by PatentIndex Score
4 records- 0169US8609318B2Radiation-sensitive resin composition, method for forming resist pattern and polymerNAKAHARA KAZUO·Filed 2011·Granted Dec 17, 2013·2 cites·7 claims
- 0265US8647810B2Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor deviceNAKAHARA KAZUO·Filed 2011·Granted Feb 11, 2014·1 cites·12 claims
- 0365US8603726B2Radiation-sensitive resin composition, polymer and compoundNAKAHARA KAZUO·Filed 2011·Granted Dec 10, 2013·1 cites·11 claims
- 0463US8697335B2Radiation-sensitive resin composition and compoundNAKAHARA KAZUO·Filed 2012·Granted Apr 15, 2014·1 cites·7 claims
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