Assignee
NIKON PREC INC
US·14 granted patents·3 pending applications·1,223 citations·filing 1998–2013
Top patents by PatentIndex Score
17 records- 0199US6191429B1Projection exposure apparatus and method with workpiece area detectionNIKON PREC INC·Filed 1999·Granted Feb 20, 2001·962 cites·14 claims
- 0295US6842223B2Enhanced illuminator for use in photolithographic systemsNIKON PREC INC·Filed 2003·Granted Jan 11, 2005·82 cites·25 claims
- 0395US6750952B2Apparatus for preforming measurement of a dimension of a test mark for semiconductor processingNIKON PREC INC·Filed 2002·Granted Jun 15, 2004·63 cites·32 claims
- 0486US6664121B2Method and apparatus for position measurement of a pattern formed by a lithographic exposure toolNIKON PREC INC·Filed 2002·Granted Dec 16, 2003·38 cites·30 claims
- 0579US6436589B1Reticle having an interleave kerfNIKON PREC INC·Filed 2000·Granted Aug 20, 2002·17 cites·7 claims
- 0676US9529253B2Predicting pattern critical dimensions in a lithographic exposure processNIKON PREC INC·Filed 2013·Granted Dec 27, 2016·2 cites·18 claims
- 0775US6974653B2Methods for critical dimension and focus mapping using critical dimension test marksNIKON PREC INC·Filed 2002·Granted Dec 13, 2005·26 cites·30 claims
- 0863US6943882B2Method to diagnose imperfections in illuminator of a lithographic toolNIKON PREC INC·Filed 2002·Granted Sep 13, 2005·8 cites·41 claims
- 0953US8027813B2Method and system for reconstructing aberrated image profiles through simulationNIKON PREC INC·Filed 2004·Granted Sep 27, 2011·5 cites·17 claims
- 1051USRE41681EEnhanced illuminator for use in photolithographic systemsNIKON PREC INC·Filed 2006·Granted Sep 14, 2010·0 cites·70 claims
- 1151US6538753B2Method and apparatus for dimension measurement of a pattern formed by lithographic exposure toolsNIKON PREC INC·Filed 2001·Granted Mar 25, 2003·6 cites·60 claims
- 1251US2013044308A1System and method for an adjusting optical proximity effect for an exposure apparatusNIKON PREC INC·Filed 2012·Application pending·0 cites
- 1348US6956659B2Measurement of critical dimensions of etched featuresNIKON PREC INC·Filed 2002·Granted Oct 18, 2005·4 cites·30 claims
- 1442US6323938B1Method of characterizing photolithographic tool performance and photolithographic tool thereofNIKON PREC INC·Filed 1998·Granted Nov 27, 2001·8 cites·5 claims
- 1539US2007270080A1Non-contact chemical mechanical polishing wafer edge control apparatus and methodNIKON PREC INC·Filed 2006·Application pending·0 cites
- 1634US2007139630A1Changeable Slit to Control Uniformity of IlluminationNIKON PREC INC·Filed 2006·Application pending·0 cites
- 1732US6490105B2Stage mirror retention systemNIKON PREC INC·Filed 2001·Granted Dec 3, 2002·2 cites·58 claims
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →