Assignee
NISHIKAWA SEIJI
JP·1 granted patent·2 pending applications·0 citations·filing 2011–2011
Top patents by PatentIndex Score
3 records- 0137US8889568B2Method and apparatus for producing silicon nitride filmNISHIKAWA SEIJI·Filed 2011·Granted Nov 18, 2014·0 cites·6 claims
- 0229US2013075875A1Silicon nitride film of semiconductor element, and method and apparatus for producing silicon nitride filmNISHIKAWA SEIJI·Filed 2011·Application pending·0 cites
- 0328US2013071671A1Silicon nitride film for semiconductor element, and method and apparatus for manufacturing silicon nitride filmNISHIKAWA SEIJI·Filed 2011·Application pending·0 cites
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