Assignee
NITTA HAAS INC
JP·12 granted patents·6 pending applications·6 citations·filing 2005–2017
Top patents by PatentIndex Score
18 records- 0188US10625392B2Polishing padNITTA HAAS INC·Filed 2016·Granted Apr 21, 2020·3 cites·2 claims
- 0271US10696869B2Polishing compositionNITTA HAAS INC·Filed 2016·Granted Jun 30, 2020·2 cites·6 claims
- 0358US7611552B2Semiconductor polishing compositionNITTA HAAS INC·Filed 2005·Granted Nov 3, 2009·1 cites·4 claims
- 0455US10344187B2Polishing composition and polishing method using the sameNITTA HAAS INC·Filed 2014·Granted Jul 9, 2019·0 cites·6 claims
- 0551US2011198531A1Composition for polishing silicon nitride and method of controlling selectivity using sameNITTA HAAS INC·Filed 2009·Application pending·0 cites
- 0646US10421884B2Method of controlling selectivity using composition for polishing silicon nitrideNITTA HAAS INC·Filed 2016·Granted Sep 24, 2019·0 cites·2 claims
- 0745US9593259B2Polishing compositionNITTA HAAS INC·Filed 2013·Granted Mar 14, 2017·0 cites·6 claims
- 0843US2015259575A1Polishing compositionNITTA HAAS INC·Filed 2015·Application pending·0 cites
- 0942US11791164B2Polishing composition and polishing methodNITTA HAAS INC·Filed 2015·Granted Oct 17, 2023·0 cites·11 claims
- 1041US2019283205A1Polishing rollNITTA HAAS INC·Filed 2017·Application pending·0 cites
- 1138US10077380B2Polishing compositionNITTA HAAS INC·Filed 2015·Granted Sep 18, 2018·0 cites·6 claims
- 1238US9303191B2Polishing compositionNITTA HAAS INC·Filed 2013·Granted Apr 5, 2016·0 cites·4 claims
- 1338US2019077049A1Polishing pad material purification systemNITTA HAAS INC·Filed 2016·Application pending·0 cites
- 1437US2019001240A1Filtration deviceNITTA HAAS INC·Filed 2016·Application pending·0 cites
- 1537US2019084187A1Polishing pad material melting deviceNITTA HAAS INC·Filed 2016·Application pending·0 cites
- 1634US10435588B2Polishing compositionNITTA HAAS INC·Filed 2016·Granted Oct 8, 2019·0 cites·3 claims
- 1734US10344184B2Polishing compositionNITTA HAAS INC·Filed 2015·Granted Jul 9, 2019·0 cites·6 claims
- 1830US10249486B2Method for polishing semiconductor substrateNITTA HAAS INC·Filed 2015·Granted Apr 2, 2019·0 cites·4 claims
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