Assignee
NOZAWA OSAMU
JP14 patents
Top patents by PatentIndex Score
US8524421B2Sep 3, 2013
Mask blank, transfer mask, methods of manufacturing the same and method of manufacturing a semiconductor device
NOZAWA OSAMU5 citations84
US8137868B2Mar 20, 2012
Photomask blank, photomask, and methods of manufacturing the same
NOZAWA OSAMU7 citations84
US8999609B2Apr 7, 2015
Phase shift mask blank, method of manufacturing the same, and phase shift mask
NOZAWA OSAMU2 citations62
US9017902B2Apr 28, 2015
Mask blank, transfer mask, and method of manufacturing a transfer mask
NOZAWA OSAMU0 citations52
US8709681B2Apr 29, 2014
Mask blank, transfer mask, and film denseness evaluation method
NOZAWA OSAMU0 citations52
US8614035B2Dec 24, 2013
Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank
NOZAWA OSAMU0 citations52
US8518609B2Aug 27, 2013
Photomask blank, photomask, and photomask manufacturing method
NOZAWA OSAMU0 citations52
US8435704B2May 7, 2013
Mask blank, transfer mask, and methods of manufacturing the same
NOZAWA OSAMU0 citations52
US8293435B2Oct 23, 2012
Photomask blank, photomask, and methods of manufacturing the same
NOZAWA OSAMU0 citations52
US8283092B2Oct 9, 2012
Photomask blank, photomask, and photomask manufacturing method
NOZAWA OSAMU0 citations52
US8268515B2Sep 18, 2012
Mask blank and method of manufacturing a transfer mask
NOZAWA OSAMU0 citations52
US8216747B2Jul 10, 2012
Phase shift mask blank, phase shift mask, and method for manufacturing phase shift mask blank
NOZAWA OSAMU0 citations52
US8137867B2Mar 20, 2012
Photomask blank, photomask, and methods of manufacturing the same
NOZAWA OSAMU1 citations52
US8883022B2Nov 11, 2014
Mask blank and method of manufacturing an imprinting mold
NOZAWA OSAMU0 citations42