Assignee
NOZAWA TOSHIHISA
JP·11 granted patents·3 pending applications·14 citations·filing 2004–2012
Top patents by PatentIndex Score
14 records- 0182US8973527B2Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatusNOZAWA TOSHIHISA·Filed 2009·Granted Mar 10, 2015·4 cites·5 claims
- 0268US8123194B2On-off valve and process apparatus employing the on-off valveNOZAWA TOSHIHISA·Filed 2008·Granted Feb 28, 2012·2 cites·6 claims
- 0366US8173928B2Processing deviceNOZAWA TOSHIHISA·Filed 2007·Granted May 8, 2012·2 cites·9 claims
- 0464US8974628B2Plasma treatment device and optical monitor deviceNOZAWA TOSHIHISA·Filed 2011·Granted Mar 10, 2015·2 cites·10 claims
- 0553US8110044B2Substrate processing apparatus and temperature control deviceNOZAWA TOSHIHISA·Filed 2004·Granted Feb 7, 2012·4 cites·22 claims
- 0651US8968472B2Valve and processing apparatus provided with the sameNOZAWA TOSHIHISA·Filed 2008·Granted Mar 3, 2015·0 cites·19 claims
- 0750US8500089B2Method of operating on-off valveNOZAWA TOSHIHISA·Filed 2012·Granted Aug 6, 2013·0 cites·6 claims
- 0849US8785809B2Processing deviceNOZAWA TOSHIHISA·Filed 2012·Granted Jul 22, 2014·0 cites·20 claims
- 0949US8158012B2Film forming apparatus and method for manufacturing light emitting elementNOZAWA TOSHIHISA·Filed 2007·Granted Apr 17, 2012·0 cites·7 claims
- 1049US2012156884A1Film forming method of amorphous carbon film and manufacturing method of semiconductor device using the sameNOZAWA TOSHIHISA·Filed 2012·Application pending·0 cites
- 1142US9277637B2Apparatus for plasma treatment and method for plasma treatmentNOZAWA TOSHIHISA·Filed 2011·Granted Mar 1, 2016·0 cites·19 claims
- 1240US2008271471A1Temperature Controlling Method for Substrate Processing System and Substrate Processing SystemNOZAWA TOSHIHISA·Filed 2004·Application pending·0 cites
- 1339US2007163502A1Substrate processing apparatusNOZAWA TOSHIHISA·Filed 2004·Application pending·0 cites
- 1438US8969210B2Plasma etching apparatus, plasma etching method, and semiconductor device manufacturing methodNOZAWA TOSHIHISA·Filed 2011·Granted Mar 3, 2015·0 cites·6 claims
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