Assignee
OCTEC INC
JP·11 granted patents·2 pending applications·92 citations·filing 2005–2018
Top patents by PatentIndex Score
13 records- 0195US7585386B2Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing methodOCTEC INC·Filed 2005·Granted Sep 8, 2009·33 cites·12 claims
- 0286US7922862B2Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing methodOCTEC INC·Filed 2009·Granted Apr 12, 2011·9 cites·18 claims
- 0383US7686588B2Liquid chemical supply system having a plurality of pressure detectorsOCTEC INC·Filed 2006·Granted Mar 30, 2010·11 cites·17 claims
- 0480US7649369B2Probe and method of manufacturing probeOCTEC INC·Filed 2005·Granted Jan 19, 2010·7 cites·2 claims
- 0577US7383732B2Device for inspecting micro structure, method for inspecting micro structure and program for inspecting micro structureOCTEC INC·Filed 2005·Granted Jun 10, 2008·11 cites·30 claims
- 0676US7470998B2Semiconductor device and method of manufacturing the sameOCTEC INC·Filed 2006·Granted Dec 30, 2008·6 cites·7 claims
- 0769US7988429B2Chemical liquid supply systemOCTEC INC·Filed 2005·Granted Aug 2, 2011·6 cites·10 claims
- 0867US7942647B2Pump for supplying chemical liquidsOCTEC INC·Filed 2005·Granted May 17, 2011·3 cites·6 claims
- 0967US7750654B2Probe method, prober, and electrode reducing/plasma-etching processing mechanismOCTEC INC·Filed 2005·Granted Jul 6, 2010·5 cites·27 claims
- 1062US9035453B2Semiconductor deviceOCTEC INC·Filed 2012·Granted May 19, 2015·1 cites·6 claims
- 1146US2007297927A1Pump for Supplying Chemical LiquidsOCTEC INC·Filed 2005·Application pending·0 cites
- 1240US7862959B2Transfer mask for exposure and pattern exchanging method of the sameOCTEC INC·Filed 2005·Granted Jan 4, 2011·0 cites·10 claims
- 1329US2021407046A1Information processing device, information processing system, and information processing methodOCTEC INC·Filed 2018·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →