Assignee
OGIHARA TSUTOMU
JP·16 granted patents·111 citations·filing 2007–2012
Top patents by PatentIndex Score
16 records- 0196US8951917B2Composition for forming resist underlayer film and patterning process using the sameOGIHARA TSUTOMU·Filed 2012·Granted Feb 10, 2015·16 cites·24 claims
- 0295US8501386B2Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning processOGIHARA TSUTOMU·Filed 2011·Granted Aug 6, 2013·14 cites·14 claims
- 0394US8835102B2Patterning process and composition for forming silicon-containing film usable thereforOGIHARA TSUTOMU·Filed 2012·Granted Sep 16, 2014·9 cites·15 claims
- 0493US8852844B2Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning processOGIHARA TSUTOMU·Filed 2009·Granted Oct 7, 2014·18 cites·24 claims
- 0590US8663898B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Mar 4, 2014·7 cites·28 claims
- 0690US8329376B2Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning methodOGIHARA TSUTOMU·Filed 2007·Granted Dec 11, 2012·17 cites·14 claims
- 0788US8932953B2Composition for forming a silicon-containing resist underlayer film and patterning process using the sameOGIHARA TSUTOMU·Filed 2012·Granted Jan 13, 2015·6 cites·30 claims
- 0887US8853031B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Oct 7, 2014·5 cites·28 claims
- 0987US8652750B2Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning methodOGIHARA TSUTOMU·Filed 2008·Granted Feb 18, 2014·9 cites·15 claims
- 1080US8877422B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Nov 4, 2014·3 cites·20 claims
- 1174US8859189B2Patterning processOGIHARA TSUTOMU·Filed 2012·Granted Oct 14, 2014·3 cites·17 claims
- 1274US8592956B2Resist underlayer film composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2011·Granted Nov 26, 2013·2 cites·26 claims
- 1363US8603732B2Resist underlayer film-forming composition, process for forming resist underlayer film and patterning processOGIHARA TSUTOMU·Filed 2010·Granted Dec 10, 2013·1 cites·34 claims
- 1462US8697330B2Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the sameOGIHARA TSUTOMU·Filed 2010·Granted Apr 15, 2014·1 cites·10 claims
- 1553US8652267B2Coated-type silicon-containing film stripping processOGIHARA TSUTOMU·Filed 2009·Granted Feb 18, 2014·0 cites·8 claims
- 1651US8927192B2Production method of resist composition for lithographyOGIHARA TSUTOMU·Filed 2012·Granted Jan 6, 2015·0 cites·4 claims
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