Assignee

OHARA ANTHONY

GB·1 granted patent·0 citations·filing 2012–2012

Technology mixB81C1 C23F1 H01L1 H10P1

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0135US10354884B2Vapour etch of silicon dioxide with improved selectivityOHARA ANTHONY·Filed 2012·Granted Jul 16, 2019·0 cites·14 claims

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