Assignee
OHASHI MASAKI
JP·9 granted patents·199 citations·filing 2009–2011
Top patents by PatentIndex Score
9 records- 0197US8057985B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Nov 15, 2011·52 cites·11 claims
- 0296US8283104B2Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the sameOHASHI MASAKI·Filed 2010·Granted Oct 9, 2012·14 cites·20 claims
- 0396US8114571B2Photoacid generator, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Feb 14, 2012·29 cites·17 claims
- 0496US8105748B2Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning processOHASHI MASAKI·Filed 2009·Granted Jan 31, 2012·81 cites·11 claims
- 0593US8394570B2Sulfonium salt, acid generator, resist composition, photomask blank, and patterning processOHASHI MASAKI·Filed 2009·Granted Mar 12, 2013·12 cites·12 claims
- 0689US8609889B2Photoacid generator, resist composition, and patterning processOHASHI MASAKI·Filed 2010·Granted Dec 17, 2013·6 cites·15 claims
- 0787US8691490B2Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning processOHASHI MASAKI·Filed 2011·Granted Apr 8, 2014·4 cites·2 claims
- 0872US8323536B2Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive filmOHASHI MASAKI·Filed 2011·Granted Dec 4, 2012·1 cites·8 claims
- 0942US9069245B2Near-infrared absorptive layer-forming composition and multilayer filmOHASHI MASAKI·Filed 2011·Granted Jun 30, 2015·0 cites·15 claims
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