Assignee
OLIN MICROELECTRONIC CHEM INC
US·25 granted patents·976 citations·filing 1995–1998
Top patents by PatentIndex Score
25 records- 0196US6030932ACleaning composition and method for removing residuesOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Feb 29, 2000·120 cites·19 claims
- 0294US5977041AAqueous rinsing compositionOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Nov 2, 1999·96 cites·9 claims
- 0392US5798323ANon-corrosive stripping and cleaning compositionOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Aug 25, 1998·120 cites·7 claims
- 0487US6033993AProcess for removing residues from a semiconductor substrateOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Mar 7, 2000·124 cites·22 claims
- 0586US5863701APolymers containing protected styrene and unprotected hydroxbenzyl (meth) acrylamidesOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Jan 26, 1999·56 cites·5 claims
- 0684US6042989ARadiation sensitive compositions of terpolymers containing organosilicon side chainsOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Mar 28, 2000·40 cites·9 claims
- 0783US5612304ARedox reagent-containing post-etch residue cleaning compositionOLIN MICROELECTRONIC CHEM INC·Filed 1995·Granted Mar 18, 1997·75 cites·21 claims
- 0881US5856065ANegative working photoresist composition based on polyimide primersOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Jan 5, 1999·45 cites·18 claims
- 0977US6028154ATerpolymers containing organosilicon side chainsOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Feb 22, 2000·28 cites·8 claims
- 1076US5886119ATerpolymers containing organosilicon side chainsOLIN MICROELECTRONIC CHEM INC·Filed 1996·Granted Mar 23, 1999·32 cites·9 claims
- 1171US5985507ASelected high thermal novolaks and positive-working radiation-sensitive compositionsOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Nov 16, 1999·23 cites·20 claims
- 1271US5759973APhotoresist stripping and cleaning compositionsOLIN MICROELECTRONIC CHEM INC·Filed 1996·Granted Jun 2, 1998·31 cites·15 claims
- 1366US5817610ANon-corrosive cleaning composition for removing plasma etching residuesOLIN MICROELECTRONIC CHEM INC·Filed 1996·Granted Oct 6, 1998·27 cites·8 claims
- 1464US6020292ANon-corrosive cleaning composition for removing plasma etching residuesOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Feb 1, 2000·24 cites·3 claims
- 1564US5928818APhotoresist compositionsOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Jul 27, 1999·28 cites·16 claims
- 1662US5849808AOrganic solvent soluble photoresists which are developable in aqueous alkaline solutionsOLIN MICROELECTRONIC CHEM INC·Filed 1996·Granted Dec 15, 1998·23 cites·17 claims
- 1759US5674657APositive-working photoresist compositions comprising an alkali-soluble novolak resin made with four phenolic monomersOLIN MICROELECTRONIC CHEM INC·Filed 1996·Granted Oct 7, 1997·18 cites·14 claims
- 1857US5714559ACrosslinked polymersOLIN MICROELECTRONIC CHEM INC·Filed 1995·Granted Feb 3, 1998·16 cites·11 claims
- 1954US5780566APolymers containing protected styrene and unprotected hydroxybenzyl (meth)acrylamidesOLIN MICROELECTRONIC CHEM INC·Filed 1995·Granted Jul 14, 1998·13 cites·6 claims
- 2051US6027853AProcess for preparing a radiation-sensitive compositionOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Feb 22, 2000·12 cites·21 claims
- 2148US5789524AChemical imidization reagent for polyimide synthesisOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Aug 4, 1998·9 cites·7 claims
- 2244US6040107APhotosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixturesOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Mar 21, 2000·2 cites·7 claims
- 2341US5834531ACrosslinked polymersOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Nov 10, 1998·5 cites·16 claims
- 2441US5789525AProcess for making polyimides from diamines and tetracarboxylic diacid diesterOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Aug 4, 1998·6 cites·5 claims
- 2535US5834581AProcess for making polyimide-polyamic ester copolymersOLIN MICROELECTRONIC CHEM INC·Filed 1997·Granted Nov 10, 1998·3 cites·2 claims
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