Assignee
RODEL INC
US122 patents
Top patents by PatentIndex Score
US6022268AFeb 8, 2000
Polishing pads and methods relating thereto
RODEL INC157 citations99
US5605760AFeb 25, 1997
Polishing pads
RODEL INC424 citations99
US4959113ASep 25, 1990
Method and composition for polishing metal surfaces
RODEL INC201 citations99
US6454634B1Sep 24, 2002
Polishing pads for chemical mechanical planarization
RODEL INC123 citations98
US6171181B1Jan 9, 2001
Molded polishing pad having integral window
RODEL INC165 citations98
US6022264AFeb 8, 2000
Polishing pad and methods relating thereto
RODEL INC99 citations98
US6017265AJan 25, 2000
Methods for using polishing pads
RODEL INC186 citations98
US5738800AApr 14, 1998
Composition and method for polishing a composite of silica and silicon nitride
RODEL INC117 citations98
US5389352AFeb 14, 1995
Oxide particles and method for producing them
RODEL INC117 citations98
US6749485B1Jun 15, 2004
Hydrolytically stable grooved polishing pads for chemical mechanical planarization
RODEL INC98 citations97
US6736709B1May 18, 2004
Grooved polishing pads for chemical mechanical planarization
RODEL INC96 citations97
US6069080AMay 30, 2000
Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
RODEL INC126 citations97
US5900164AMay 4, 1999
Method for planarizing a semiconductor device surface with polymeric pad containing hollow polymeric microelements
RODEL INC141 citations97
US5693239ADec 2, 1997
Polishing slurries comprising two abrasive components and methods for their use
RODEL INC133 citations97
US5578362ANov 26, 1996
Polymeric polishing pad containing hollow polymeric microelements
RODEL INC433 citations97
US5476606ADec 19, 1995
Compositions and methods for polishing
RODEL INC144 citations97
US5391258AFeb 21, 1995
Compositions and methods for polishing
RODEL INC256 citations97
US5264010ANov 23, 1993
Compositions and methods for polishing and planarizing surfaces
RODEL INC172 citations97
US5257478ANov 2, 1993
Apparatus for interlayer planarization of semiconductor material
RODEL INC311 citations97
US4927432AMay 22, 1990
Pad material for grinding, lapping and polishing
RODEL INC231 citations97
US6641471B1Nov 4, 2003
Polishing pad having an advantageous micro-texture and methods relating thereto
RODEL INC184 citations96
US6632259B2Oct 14, 2003
Chemical mechanical polishing compositions and methods relating thereto
RODEL INC43 citations96
US6582283B2Jun 24, 2003
Polishing pads for chemical mechanical planarization
RODEL INC71 citations96
US6488570B1Dec 3, 2002
Method relating to a polishing system having a multi-phase polishing layer
RODEL INC68 citations96
US6375559B1Apr 23, 2002
Polishing system having a multi-phase polishing substrate and methods relating thereto
RODEL INC61 citations96
US6210254B1Apr 3, 2001
Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern(s)
RODEL INC45 citations96
US6099394AAug 8, 2000
Polishing system having a multi-phase polishing substrate and methods relating thereto
RODEL INC82 citations96
US6095902AAug 1, 2000
Polyether-polyester polyurethane polishing pads and related methods
RODEL INC86 citations96
US6074546AJun 13, 2000
Method for photoelectrochemical polishing of silicon wafers
RODEL INC46 citations96
US6036579AMar 14, 2000
Polymeric polishing pad having photolithographically induced surface patterns(s) and methods relating thereto
RODEL INC82 citations96
US6019666AFeb 1, 2000
Mosaic polishing pads and methods relating thereto
RODEL INC69 citations96
US5932486AAug 3, 1999
Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers
RODEL INC83 citations96
US5860848AJan 19, 1999
Polishing silicon wafers with improved polishing slurries
RODEL INC99 citations96
US5756398AMay 26, 1998
Composition and method for polishing a composite comprising titanium
RODEL INC52 citations96
US5489233AFeb 6, 1996
Polishing pads and methods for their use
RODEL INC479 citations96
US6682402B1Jan 27, 2004
Polishing pads and methods relating thereto
RODEL INC47 citations95
US6439989B1Aug 27, 2002
Polymeric polishing pad having continuously regenerated work surface
RODEL INC39 citations95
US6428586B1Aug 6, 2002
Method of manufacturing a polymer or polymer/composite polishing pad
RODEL INC57 citations95
US6387312B1May 14, 2002
Molding a polishing pad having integral window
RODEL INC56 citations95
US6358130B1Mar 19, 2002
Polishing pad
RODEL INC125 citations95
US6328634B1Dec 11, 2001
Method of polishing
RODEL INC70 citations95
US6293852B1Sep 25, 2001
Polishing pads and methods relating thereto
RODEL INC46 citations95
US6231434B1May 15, 2001
Polishing pads and methods relating thereto
RODEL INC44 citations95
US6217434B1Apr 17, 2001
Polishing pads and methods relating thereto
RODEL INC50 citations95
US6218305B1Apr 17, 2001
Composition and method for polishing a composite of silica and silicon nitride
RODEL INC72 citations95
US6132637AOct 17, 2000
Composition and method for polishing a composite of silica and silicon nitride
RODEL INC44 citations95
US6042741AMar 28, 2000
Composition for polishing a composite of silica and silicon nitride
RODEL INC74 citations95
US5770103AJun 23, 1998
Composition and method for polishing a composite comprising titanium
RODEL INC66 citations95
US6607424B1Aug 19, 2003
Compositions for insulator and metal CMP and methods relating thereto
RODEL INC47 citations94
US6354915B1Mar 12, 2002
Polishing pads and methods relating thereto
RODEL INC54 citations94
Showing the top 50 of 122 patents by PatentIndex Score.