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SAGEHASHI MASAYOSHI
JP6 patents
Top patents by PatentIndex Score
US8900793B2Dec 2, 2014
Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition
SAGEHASHI MASAYOSHI7 citations83
US8597869B2Dec 3, 2013
Sulfonium salt, resist composition, and patterning process
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US8808964B2Aug 19, 2014
Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process
SAGEHASHI MASAYOSHI1 citations51
US8686166B2Apr 1, 2014
Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom
SAGEHASHI MASAYOSHI0 citations51
US8647808B2Feb 11, 2014
Fluorinated monomer, polymer, resist composition, and patterning process
SAGEHASHI MASAYOSHI0 citations51
US9207534B2Dec 8, 2015
Nitrogen-containing monomer, polymer, resist composition, and patterning process
SAGEHASHI MASAYOSHI0 citations41