Assignee

SAKAMOTO KEITARO

JP·1 granted patent·5 citations·filing 2010–2010

Technology mixC23C1 H01J1 H10F1 H10P1 Y02E1 Y02P1

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0169US8431996B2Plasma processing apparatus and method of producing amorphous silicon thin film using sameSAKAMOTO KEITARO·Filed 2010·Granted Apr 30, 2013·5 cites·10 claims

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