Assignee
SAKAMOTO RIKIMARU
JP6 patents
Top patents by PatentIndex Score
US10437150B2Oct 8, 2019
Composition for forming resist underlayer film with reduced outgassing
SAKAMOTO RIKIMARU2 citations71
US8722840B2May 13, 2014
Resist underlayer film forming composition, and method for forming resist pattern using the same
SAKAMOTO RIKIMARU6 citations71
US8435721B2May 7, 2013
Resist underlayer film forming composition and forming method of resist pattern using the same
SAKAMOTO RIKIMARU0 citations51
US11675269B2Jun 13, 2023
Composition for forming resist overlayer film for EUV lithography
SAKAMOTO RIKIMARU0 citations50
US9240327B2Jan 19, 2016
Resist underlayer film-forming composition for EUV lithography containing condensation polymer
SAKAMOTO RIKIMARU1 citations50
US9753369B2Sep 5, 2017
Polymer-containing developer
SAKAMOTO RIKIMARU0 citations39