Assignee

SAKURADA TAKAFUMI

JP·1 granted patent·0 citations·filing 2007–2007

Technology mixC01B1 C01F1 C01P1 C09K1 H10P1

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0132US8328893B2Method of producing oxide particles, slurry, polishing slurry, and method of polishing substrateSAKURADA TAKAFUMI·Filed 2007·Granted Dec 11, 2012·0 cites·46 claims

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