Assignee
SAMSUNG CORNING ADVANCED GLASS LLC
KR·1 granted patent·1 pending application·2 citations·filing 2013–2014
Top patents by PatentIndex Score
2 records- 0157US9224820B2Oxide semiconductor sputtering target, method of manufacturing thin-film transistors using the same, and thin film transistor manufactured using the sameSAMSUNG CORNING ADVANCED GLASS LLC·Filed 2013·Granted Dec 29, 2015·2 cites·6 claims
- 0243US2014352786A1ZnO-BASED SPUTTERING TARGET AND PHOTOVOLTAIC CELL HAVING PASSIVATION LAYER DEPOSITED USING THE SAMESAMSUNG CORNING ADVANCED GLASS LLC·Filed 2014·Application pending·0 cites
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