Assignee
SENSYS INSTR CORP
US·10 granted patents·397 citations·filing 1997–2003
Top patents by PatentIndex Score
10 records- 0195US6690473B1Integrated surface metrologySENSYS INSTR CORP·Filed 2000·Granted Feb 10, 2004·110 cites·9 claims
- 0293US6182510B1Apparatus and method for characterizing semiconductor wafers during processingSENSYS INSTR CORP·Filed 2000·Granted Feb 6, 2001·57 cites·20 claims
- 0389US5996415AApparatus and method for characterizing semiconductor wafers during processingSENSYS INSTR CORP·Filed 1997·Granted Dec 7, 1999·79 cites·22 claims
- 0488US6829054B2Integrated surface metrologySENSYS INSTR CORP·Filed 2003·Granted Dec 7, 2004·37 cites·6 claims
- 0581US6677602B1Notch and flat sensor for wafer alignmentSENSYS INSTR CORP·Filed 2001·Granted Jan 13, 2004·26 cites·15 claims
- 0678US6667805B2Small-spot spectrometry instrument with reduced polarizationSENSYS INSTR CORP·Filed 2001·Granted Dec 23, 2003·15 cites·25 claims
- 0774US6510395B2Method of detecting residue on a polished waferSENSYS INSTR CORP·Filed 2001·Granted Jan 21, 2003·11 cites·24 claims
- 0874US6112595AApparatus and method for characterizing semiconductor wafers during processingSENSYS INSTR CORP·Filed 1999·Granted Sep 5, 2000·32 cites·11 claims
- 0967US6019000AIn-situ measurement of deposition on reactor chamber membersSENSYS INSTR CORP·Filed 1997·Granted Feb 1, 2000·30 cites·20 claims
- 1031US6572456B2Bathless wafer measurement apparatus and methodSENSYS INSTR CORP·Filed 2001·Granted Jun 3, 2003·0 cites·17 claims
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