Assignee
SENZAKI TAKAHIRO
JP·4 granted patents·1 pending application·13 citations·filing 2007–2012
Top patents by PatentIndex Score
5 records- 0185US8999631B2Primer and pattern forming method for layer including block copolymerSENZAKI TAKAHIRO·Filed 2011·Granted Apr 7, 2015·7 cites·6 claims
- 0280US9134617B2Solvent developable negative resist composition, resist pattern formation method, and method for forming pattern of layer including block copolymerSENZAKI TAKAHIRO·Filed 2012·Granted Sep 15, 2015·4 cites·18 claims
- 0364US8288078B2Photosensitive resin composition, and pattern formation method using the sameSENZAKI TAKAHIRO·Filed 2008·Granted Oct 16, 2012·2 cites·11 claims
- 0446US8617795B2Photosensitive resin composition and pattern forming method using the sameSENZAKI TAKAHIRO·Filed 2007·Granted Dec 31, 2013·0 cites·10 claims
- 0537US2014127626A1Resist composition for negative development which is used for formation of guide pattern, guide pattern formation method, and method for forming pattern on layer containing block copolymerSENZAKI TAKAHIRO·Filed 2011·Application pending·0 cites
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