Assignee
SEWELL HARRY
US13 patents
Top patents by PatentIndex Score
US8623588B2Jan 7, 2014
Scanning EUV interference imaging for extremely high resolution patterning
SEWELL HARRY8 citations84
US8817226B2Aug 26, 2014
Systems and methods for insitu lens cleaning using ozone in immersion lithography
SEWELL HARRY4 citations72
US8629970B2Jan 14, 2014
Immersion lithographic apparatus with immersion fluid re-circulating system
SEWELL HARRY5 citations71
US8654311B2Feb 18, 2014
Lithographic apparatus and device manufacturing method
SEWELL HARRY3 citations62
US8339571B2Dec 25, 2012
Lithographic method and apparatus
SEWELL HARRY2 citations62
US9046754B2Jun 2, 2015
EUV mask inspection system
SEWELL HARRY2 citations61
US8625096B2Jan 7, 2014
Method and system for increasing alignment target contrast
SEWELL HARRY3 citations60
US8456611B2Jun 4, 2013
System and method to increase surface tension and contact angle in immersion lithography
SEWELL HARRY0 citations52
US8089609B2Jan 3, 2012
Lithographic apparatus and device manufacturing method
SEWELL HARRY1 citations52
US8709908B2Apr 29, 2014
Improving alignment target contrast in a lithographic double patterning process
SEWELL HARRY1 citations50
US8736807B2May 27, 2014
Systems and methods for thermally-induced aberration correction in immersion lithography
SEWELL HARRY0 citations48
US8654305B2Feb 18, 2014
Systems and methods for insitu lens cleaning in immersion lithography
SEWELL HARRY0 citations40
US8451422B2May 28, 2013
Re-flow and buffer system for immersion lithography
SEWELL HARRY0 citations39