Assignee

SHIGETA KAKU

JP·1 granted patent·1 citations·filing 2012–2012

Technology mixB41N1 G03F1 H01L1 H05K1 H10P1 H10W1

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0152US9188873B2Substrate having etching mask and method for producing sameSHIGETA KAKU·Filed 2012·Granted Nov 17, 2015·1 cites·14 claims

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