Assignee
SHIONO DAIJU
JP·6 granted patents·1 pending application·25 citations·filing 2007–2011
Top patents by PatentIndex Score
7 records- 0193US8221956B2Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compoundSHIONO DAIJU·Filed 2009·Granted Jul 17, 2012·20 cites·9 claims
- 0280US8642244B2Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compoundSHIONO DAIJU·Filed 2011·Granted Feb 4, 2014·3 cites·7 claims
- 0376US8475997B2Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compoundSHIONO DAIJU·Filed 2011·Granted Jul 2, 2013·2 cites·17 claims
- 0462US8742038B2Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compoundSHIONO DAIJU·Filed 2009·Granted Jun 3, 2014·0 cites·28 claims
- 0549US8304163B2Compound, dissolution inhibitor, positive type resist composition, and method of forming resist patternSHIONO DAIJU·Filed 2010·Granted Nov 6, 2012·0 cites·1 claims
- 0646US8257903B2Compound, positive resist composition and method for formation of resist patternSHIONO DAIJU·Filed 2007·Granted Sep 4, 2012·0 cites·14 claims
- 0745US2007275328A1Decomposable composition and method for using the sameSHIONO DAIJU·Filed 2007·Application pending·0 cites
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