Assignee

SON DUKHYUN

KR·1 granted patent·8 citations·filing 2011–2011

Technology mixH01G1 H01J1 H05H1

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0174US9715996B2Adjustable capacitor, plasma impedance matching device, plasma impedance matching method, and substrate treating apparatusSON DUKHYUN·Filed 2011·Granted Jul 25, 2017·8 cites·27 claims

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