Assignee
STUETZLE RALF
DE·2 granted patents·5 citations·filing 2008–2010
Technology mixG03F2
Top patents by PatentIndex Score
2 records- 0176US9310692B2Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatusSTUETZLE RALF·Filed 2010·Granted Apr 12, 2016·3 cites·35 claims
- 0264US8179519B2Adjusting device with a laser light source and a reflector for aligning a microlithography projection exposure installationSTUETZLE RALF·Filed 2008·Granted May 15, 2012·2 cites·21 claims
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