Assignee
SUPERCRITICAL SYSTEMS INC
US·3 granted patents·11 pending applications·226 citations·filing 1999–2009
Top patents by PatentIndex Score
14 records- 0193US6277753B1Removal of CMP residue from semiconductors using supercritical carbon dioxide processSUPERCRITICAL SYSTEMS INC·Filed 1999·Granted Aug 21, 2001·153 cites·17 claims
- 0291US7494107B2Gate valve for plus-atmospheric pressure semiconductor process vesselsSUPERCRITICAL SYSTEMS INC·Filed 2005·Granted Feb 24, 2009·28 cites·15 claims
- 0390US6736149B2Method and apparatus for supercritical processing of multiple workpiecesSUPERCRITICAL SYSTEMS INC·Filed 2002·Granted May 18, 2004·45 cites·3 claims
- 0455US2010000681A1Phase change based heating element system and methodSUPERCRITICAL SYSTEMS INC·Filed 2009·Application pending·0 cites
- 0544US2005022850A1Regulation of flow of processing chemistry only into a processing chamberSUPERCRITICAL SYSTEMS INC·Filed 2003·Application pending·0 cites
- 0641US2006102282A1Method and apparatus for selectively filtering residue from a processing chamberSUPERCRITICAL SYSTEMS INC·Filed 2004·Application pending·0 cites
- 0739US2005227187A1Ionic fluid in supercritical fluid for semiconductor processingSUPERCRITICAL SYSTEMS INC·Filed 2005·Application pending·0 cites
- 0838US2005067002A1Processing chamber including a circulation loop integrally formed in a chamber housingSUPERCRITICAL SYSTEMS INC·Filed 2003·Application pending·0 cites
- 0938US2005034660A1Alignment means for chamber closure to reduce wear on surfacesSUPERCRITICAL SYSTEMS INC·Filed 2003·Application pending·0 cites
- 1037US2008109509A1Computer architecture for communicating between objectsSUPERCRITICAL SYSTEMS INC·Filed 2003·Application pending·0 cites
- 1136US2003155541A1Pressure enhanced diaphragm valveSUPERCRITICAL SYSTEMS INC·Filed 2003·Application pending·0 cites
- 1236US2004177867A1Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removalSUPERCRITICAL SYSTEMS INC·Filed 2003·Application pending·0 cites
- 1335US2004154647A1Method and apparatus of utilizing a coating for enhanced holding of a semiconductor substrate during high pressure processingSUPERCRITICAL SYSTEMS INC·Filed 2003·Application pending·0 cites
- 1432US2005035514A1Vacuum chuck apparatus and method for holding a wafer during high pressure processingSUPERCRITICAL SYSTEMS INC·Filed 2003·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →