Assignee
SVG LITHOGRAPHY SYSTEMS INC
US·36 granted patents·2,427 citations·filing 1987–2000
Top patents by PatentIndex Score
36 records- 0198US5815310AHigh numerical aperture ring field optical reduction systemSVG LITHOGRAPHY SYSTEMS INC·Filed 1995·Granted Sep 29, 1998·238 cites·18 claims
- 0297US5537260ACatadioptric optical reduction system with high numerical apertureSVG LITHOGRAPHY SYSTEMS INC·Filed 1993·Granted Jul 16, 1996·168 cites·31 claims
- 0395US5631721AHybrid illumination system for use in photolithographySVG LITHOGRAPHY SYSTEMS INC·Filed 1995·Granted May 20, 1997·181 cites·47 claims
- 0494US5757160AMoving interferometer wafer stageSVG LITHOGRAPHY SYSTEMS INC·Filed 1996·Granted May 26, 1998·152 cites·19 claims
- 0593US6195201B1Reflective fly's eye condenser for EUV lithographySVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Feb 27, 2001·185 cites·58 claims
- 0693US5477057AOff axis alignment system for scanning photolithographySVG LITHOGRAPHY SYSTEMS INC·Filed 1994·Granted Dec 19, 1995·135 cites·23 claims
- 0792US5684566AIllumination system and method employing a deformable mirror and diffractive optical elementsSVG LITHOGRAPHY SYSTEMS INC·Filed 1995·Granted Nov 4, 1997·127 cites·23 claims
- 0892US5559601AMask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angleSVG LITHOGRAPHY SYSTEMS INC·Filed 1995·Granted Sep 24, 1996·104 cites·5 claims
- 0991US6360012B1In situ projection optic metrology method and apparatusSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Mar 19, 2002·80 cites·26 claims
- 1090US6013401AMethod of controlling illumination field to reduce line width variationSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Jan 11, 2000·78 cites·4 claims
- 1189US5956192AFour mirror EUV projection opticsSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Sep 21, 1999·76 cites·14 claims
- 1288US5212593ABroad band optical reduction system using matched multiple refractive element materialsSVG LITHOGRAPHY SYSTEMS INC·Filed 1992·Granted May 18, 1993·85 cites·13 claims
- 1385US6259513B1Illumination system with spatially controllable partial coherenceSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Jul 10, 2001·57 cites·10 claims
- 1485US6097474ADynamically adjustable high resolution adjustable slitSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Aug 1, 2000·55 cites·8 claims
- 1585US5895737AMethod for adjusting an illumination field based on selected reticle featureSVG LITHOGRAPHY SYSTEMS INC·Filed 1998·Granted Apr 20, 1999·49 cites·11 claims
- 1684US5285142AWafer stage with reference surfaceSVG LITHOGRAPHY SYSTEMS INC·Filed 1993·Granted Feb 8, 1994·92 cites·11 claims
- 1781US6486940B1High numerical aperture catadioptric lensSVG LITHOGRAPHY SYSTEMS INC·Filed 2000·Granted Nov 26, 2002·23 cites·20 claims
- 1880US5724122AIllumination system having spatially separate vertical and horizontal image planes for use in photolithographySVG LITHOGRAPHY SYSTEMS INC·Filed 1995·Granted Mar 3, 1998·63 cites·29 claims
- 1978US5966216AOn-axix mask and wafer alignment systemSVG LITHOGRAPHY SYSTEMS INC·Filed 1994·Granted Oct 12, 1999·32 cites·17 claims
- 2077US6292255B1Dose correction for along scan linewidth variationSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Sep 18, 2001·51 cites·15 claims
- 2177US5966202AAdjustable slitSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Oct 12, 1999·33 cites·19 claims
- 2272US6469793B1Multi-channel grating interference alignment sensorSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Oct 22, 2002·41 cites·19 claims
- 2372US5896188AReduction of pattern noise in scanning lithographic system illuminatorsSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Apr 20, 1999·31 cites·18 claims
- 2472US4986007AReticle frame assemblySVG LITHOGRAPHY SYSTEMS INC·Filed 1987·Granted Jan 22, 1991·23 cites·9 claims
- 2571US5973764AVacuum assisted debris removal systemSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Oct 26, 1999·32 cites·17 claims
- 2670US5767523AMultiple detector alignment system for photolithographySVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Jun 16, 1998·29 cites·24 claims
- 2768US5727685AReticle container with corner holdingSVG LITHOGRAPHY SYSTEMS INC·Filed 1996·Granted Mar 17, 1998·46 cites·19 claims
- 2867US4973217AWafer handling systemSVG LITHOGRAPHY SYSTEMS INC·Filed 1989·Granted Nov 27, 1990·35 cites·4 claims
- 2966US6445439B1EUV reticle thermal managementSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Sep 3, 2002·31 cites·28 claims
- 3062US5352962ABrushless polyphase reduced force variation motorSVG LITHOGRAPHY SYSTEMS INC·Filed 1993·Granted Oct 4, 1994·22 cites·1 claims
- 3156US5966215ALine width insensitive wafer target detection in two directionsSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Oct 12, 1999·14 cites·12 claims
- 3251US6444372B1Non absorbing reticle and method of making sameSVG LITHOGRAPHY SYSTEMS INC·Filed 1999·Granted Sep 3, 2002·11 cites·13 claims
- 3347US5193972AWafer handling systemSVG LITHOGRAPHY SYSTEMS INC·Filed 1991·Granted Mar 16, 1993·19 cites·4 claims
- 3443US5818575ALamp stablity diagnostic systemSVG LITHOGRAPHY SYSTEMS INC·Filed 1997·Granted Oct 6, 1998·10 cites·17 claims
- 3542US5085558AWafer handling systemSVG LITHOGRAPHY SYSTEMS INC·Filed 1990·Granted Feb 4, 1992·14 cites·3 claims
- 3639US5920396ALine width insensitive wafer target detectionSVG LITHOGRAPHY SYSTEMS INC·Filed 1996·Granted Jul 6, 1999·5 cites·17 claims
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →