Assignee

TAKASUKA MASAAKI

JP·1 granted patent·3 citations·filing 2010–2010

Technology mixC07C1 G03F1 H10P1

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1 record

0177US8969629B2Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation methodTAKASUKA MASAAKI·Filed 2010·Granted Mar 3, 2015·3 cites·6 claims

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