Assignee
TANABE MASARU
JP10 patents
Top patents by PatentIndex Score
US8455158B2Jun 4, 2013
Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
TANABE MASARU2 citations62
US8142963B2Mar 27, 2012
Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device
TANABE MASARU5 citations62
US8609304B2Dec 17, 2013
Method of manufacturing a transfer mask and method of manufacturing a semiconductor device
TANABE MASARU4 citations57
US8709683B2Apr 29, 2014
Photomask blank, photomask blank manufacturing method, and photomask manufacturing method
TANABE MASARU0 citations51
US8592106B2Nov 26, 2013
Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device
TANABE MASARU0 citations51
US8440373B2May 14, 2013
Mask blank substrate, mask blank, photomask, and methods of manufacturing the same
TANABE MASARU0 citations51
US8318387B2Nov 27, 2012
Mask blank substrate set and mask blank set
TANABE MASARU0 citations51
US8197992B2Jun 12, 2012
Photomask blank, photomask blank manufacturing method, and photomask manufacturing method
TANABE MASARU0 citations51
US8107063B2Jan 31, 2012
Transparent article
TANABE MASARU0 citations51
US8785085B2Jul 22, 2014
Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
TANABE MASARU0 citations41