Assignee
TOKYO ELECTRIC LTD
JP·2 granted patents·1 pending application·10 citations·filing 2001–2012
Top patents by PatentIndex Score
3 records- 0163US7077917B2High-pressure processing chamber for a semiconductor waferTOKYO ELECTRIC LTD·Filed 2003·Granted Jul 18, 2006·10 cites·21 claims
- 0247US2014256147A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRIC LTD·Filed 2012·Application pending·0 cites
- 0334US7207340B2Method and system for removal of gas and plasma processing apparatusTOKYO ELECTRIC LTD·Filed 2001·Granted Apr 24, 2007·0 cites·8 claims
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →