Assignee
TORREX EQUIPMENT CORP
US·9 granted patents·926 citations·filing 1992–1999
Top patents by PatentIndex Score
9 records- 0198US6321680B2Vertical plasma enhanced process apparatus and methodTORREX EQUIPMENT CORP·Filed 1999·Granted Nov 27, 2001·526 cites·4 claims
- 0294US5551985AMethod and apparatus for cold wall chemical vapor depositionTORREX EQUIPMENT CORP·Filed 1995·Granted Sep 3, 1996·135 cites·9 claims
- 0392US6352593B1Mini-batch process chamberTORREX EQUIPMENT CORP·Filed 1997·Granted Mar 5, 2002·118 cites·20 claims
- 0470USRE36957EMethod and apparatus for cold wall chemical vapor depositionTORREX EQUIPMENT CORP·Filed 1998·Granted Nov 21, 2000·28 cites·10 claims
- 0569US6167837B1Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactorTORREX EQUIPMENT CORP·Filed 1999·Granted Jan 2, 2001·36 cites·8 claims
- 0666US6287635B1High rate silicon deposition method at low pressuresTORREX EQUIPMENT CORP·Filed 1999·Granted Sep 11, 2001·30 cites·19 claims
- 0762US5291030AOptoelectronic detector for chemical reactionsTORREX EQUIPMENT CORP·Filed 1992·Granted Mar 1, 1994·24 cites·10 claims
- 0860US6506691B2High rate silicon nitride deposition method at low pressuresTORREX EQUIPMENT CORP·Filed 1999·Granted Jan 14, 2003·22 cites·12 claims
- 0939US6235652B1High rate silicon dioxide deposition at low pressuresTORREX EQUIPMENT CORP·Filed 1999·Granted May 22, 2001·7 cites·15 claims
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