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UNITED MICROELECTRONICS CORPS

US2 patents

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US6495472B2Dec 17, 2002

Method for avoiding erosion of conductor structure during removing etching residues

UNITED MICROELECTRONICS CORPS2 citations60
US6495417B1Dec 17, 2002

Method for increasing tolerance of contact extension alignment in COB DRAM

UNITED MICROELECTRONICS CORPS2 citations54