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UNITED MICROELECTRONICS CORPS
US
2 patents
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US6495472B2
Dec 17, 2002
Method for avoiding erosion of conductor structure during removing etching residues
UNITED MICROELECTRONICS CORPS
2 citations
60
US6495417B1
Dec 17, 2002
Method for increasing tolerance of contact extension alignment in COB DRAM
UNITED MICROELECTRONICS CORPS
2 citations
54