Assignee
WAFERTECH INC
US·5 granted patents·83 citations·filing 1999–2001
Top patents by PatentIndex Score
5 records- 0189US6459491B1Non-intrusive pellicle height measurement systemWAFERTECH INC·Filed 2001·Granted Oct 1, 2002·30 cites·15 claims
- 0274US6346986B1Non-intrusive pellicle height measurement systemWAFERTECH INC·Filed 2000·Granted Feb 12, 2002·17 cites·26 claims
- 0368US6365015B1Method for depositing high density plasma chemical vapor deposition oxide in high aspect ratio gapsWAFERTECH INC·Filed 2000·Granted Apr 2, 2002·14 cites·1 claims
- 0450US6778285B1Automatic in situ pellicle height measurement systemWAFERTECH INC·Filed 2000·Granted Aug 17, 2004·8 cites·20 claims
- 0540US6207590B1Method for deposition of high stress silicon dioxide using silane based dual frequency PECVD processWAFERTECH INC·Filed 1999·Granted Mar 27, 2001·14 cites·2 claims
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