Assignee
WAKIYA KAZUMASA
JP·1 granted patent·3 pending applications·6 citations·filing 2005–2010
Top patents by PatentIndex Score
4 records- 0183US8697345B2Photoresist stripping solution and a method of stripping photoresists using the sameWAKIYA KAZUMASA·Filed 2010·Granted Apr 15, 2014·6 cites·10 claims
- 0249US2007004933A1Photoresist stripping solution and a method of stripping photoresists using the sameWAKIYA KAZUMASA·Filed 2006·Application pending·0 cites
- 0348US2006014110A1Photoresist stripping solution and a method of stripping photoresists using the sameWAKIYA KAZUMASA·Filed 2005·Application pending·0 cites
- 0437US2007269751A1Immersion Liquid for Liquid Immersion Lithography Process and Method for Forming Resist Pattern Using Such Immersion LiquidWAKIYA KAZUMASA·Filed 2005·Application pending·0 cites
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