Assignee
WANG RONGJUN
US·3 granted patents·9 citations·filing 2008–2011
Top patents by PatentIndex Score
3 records- 0176US8129280B2Substrate device having a tuned work function and methods of forming thereofWANG RONGJUN·Filed 2009·Granted Mar 6, 2012·7 cites·17 claims
- 0263US8580094B2Magnetron design for RF/DC physical vapor depositionWANG RONGJUN·Filed 2011·Granted Nov 12, 2013·1 cites·15 claims
- 0360US8992741B2Method for ultra-uniform sputter deposition using simultaneous RF and DC power on targetWANG RONGJUN·Filed 2008·Granted Mar 31, 2015·1 cites·14 claims
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