Assignee
WEI RONGHUA
US·9 granted patents·1 pending application·91 citations·filing 1992–2011
Top patents by PatentIndex Score
10 records- 0194US8753725B2Method for plasma immersion ion processing and depositing coatings in hollow substrates using a heated center electrodeWEI RONGHUA·Filed 2011·Granted Jun 17, 2014·11 cites·10 claims
- 0292US8496992B2Methods of forming nanocomposites containing nanodiamond particles by vapor depositionWEI RONGHUA·Filed 2010·Granted Jul 30, 2013·8 cites·40 claims
- 0392US8273222B2Apparatus and method for RF plasma enhanced magnetron sputter depositionWEI RONGHUA·Filed 2007·Granted Sep 25, 2012·37 cites·6 claims
- 0470US9279187B2Method for applying a diffusion barrier interlayer for high temperature componentsWEI RONGHUA·Filed 2009·Granted Mar 8, 2016·1 cites·4 claims
- 0567US8252388B2Method and apparatus for high rate, uniform plasma processing of three-dimensional objectsWEI RONGHUA·Filed 2008·Granted Aug 28, 2012·3 cites·16 claims
- 0665US9103022B2Amorphous aluminum alloy coatingsWEI RONGHUA·Filed 2007·Granted Aug 11, 2015·1 cites·9 claims
- 0764US5281535AMethod and apparatus for testing parts and materials in a controlled environment such as an atomic oxygen atmosphereWEI RONGHUA·Filed 1992·Granted Jan 25, 1994·30 cites·35 claims
- 0857US9175381B2Processing tubular surfaces using double glow dischargeWEI RONGHUA·Filed 2008·Granted Nov 3, 2015·0 cites·18 claims
- 0940US2008014466A1Glass with scratch-resistant coatingWEI RONGHUA·Filed 2006·Application pending·0 cites
- 1037US8747631B2Apparatus and method utilizing a double glow discharge plasma for sputter cleaningWEI RONGHUA·Filed 2010·Granted Jun 10, 2014·0 cites·9 claims
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