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DE2 patents
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US9013676B2Apr 21, 2015
Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography
WERBER ARMIN2 citations57
US9025128B2May 5, 2015
Actuator including magnet for a projection exposure system and projection exposure system including a magnet
WERBER ARMIN0 citations45