Assignee
WIELAND MARCO JAN-JACO
NL·20 granted patents·1 pending application·195 citations·filing 2007–2015
Top patents by PatentIndex Score
21 records- 0197US8502174B2Method of and system for exposing a targetWIELAND MARCO JAN-JACO·Filed 2010·Granted Aug 6, 2013·34 cites·30 claims
- 0296US8089056B2Projection lens arrangementWIELAND MARCO JAN JACO·Filed 2009·Granted Jan 3, 2012·29 cites·20 claims
- 0394US8618496B2Charged particle system comprising a manipulator device for manipulation of one or more charged particle beamsWIELAND MARCO JAN-JACO·Filed 2012·Granted Dec 31, 2013·38 cites·36 claims
- 0493US8258484B2Beamlet blanker arrangementWIELAND MARCO JAN JACO·Filed 2010·Granted Sep 4, 2012·16 cites·19 claims
- 0592US8653485B2Projection lens arrangementWIELAND MARCO JAN-JACO·Filed 2012·Granted Feb 18, 2014·13 cites·21 claims
- 0691US8492731B2Charged particle multi-beamlet lithography system with modulation deviceWIELAND MARCO JAN-JACO·Filed 2010·Granted Jul 23, 2013·9 cites·24 claims
- 0791US8445869B2Projection lens arrangementWIELAND MARCO JAN-JACO·Filed 2010·Granted May 21, 2013·12 cites·14 claims
- 0890US8558196B2Charged particle lithography system with aperture array coolingWIELAND MARCO JAN-JACO·Filed 2011·Granted Oct 15, 2013·11 cites·32 claims
- 0986US8987677B2Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereofWIELAND MARCO JAN-JACO·Filed 2010·Granted Mar 24, 2015·11 cites·29 claims
- 1085US8502176B2Imaging systemWIELAND MARCO JAN-JACO·Filed 2009·Granted Aug 6, 2013·8 cites·9 claims
- 1184US8604411B2Charged particle beam modulatorWIELAND MARCO JAN-JACO·Filed 2011·Granted Dec 10, 2013·6 cites·31 claims
- 1280US8921758B2Modulation device and charged particle multi-beamlet lithography system using the sameWIELAND MARCO JAN-JACO·Filed 2011·Granted Dec 30, 2014·4 cites·30 claims
- 1375US8841636B2Modulation device and charged particle multi-beamlet lithography system using the sameWIELAND MARCO JAN-JACO·Filed 2010·Granted Sep 23, 2014·2 cites·23 claims
- 1471USRE44908EElectron beam exposure systemWIELAND MARCO JAN-JACO·Filed 2012·Granted May 27, 2014·1 cites·56 claims
- 1562USRE44240EElectron beam exposure systemWIELAND MARCO JAN-JACO·Filed 2008·Granted May 28, 2013·0 cites·131 claims
- 1660US9305747B2Data path for lithography apparatusWIELAND MARCO JAN-JACO·Filed 2011·Granted Apr 5, 2016·1 cites·18 claims
- 1757USRE45049EElectron beam exposure systemWIELAND MARCO JAN-JACO·Filed 2012·Granted Jul 29, 2014·0 cites·102 claims
- 1853US9105439B2Projection lens arrangementWIELAND MARCO JAN JACO·Filed 2011·Granted Aug 11, 2015·0 cites·23 claims
- 1950US8242470B2Optical switching in a lithography systemWIELAND MARCO JAN-JACO·Filed 2007·Granted Aug 14, 2012·0 cites·56 claims
- 2039US2013120724A1Method for splitting a pattern for use in a multi-beamlet lithography apparatusWIELAND MARCO JAN-JACO·Filed 2012·Application pending·0 cites
- 2137US9460260B2Enhanced stitching by overlap dose and feature reductionWIELAND MARCO JAN-JACO·Filed 2015·Granted Oct 4, 2016·0 cites·22 claims
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