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US3 patents

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US8772214B2Jul 8, 2014

Aqueous cleaning composition for removing residues and method using same

WU AIPING2 citations58
US8288330B2Oct 16, 2012

Composition and method for photoresist removal

WU AIPING0 citations49
US8889609B2Nov 18, 2014

Cleaning formulations and method of using the cleaning formulations

WU AIPING1 citations45