Assignee

YAMANASHI PREFECTURAL FEDERATI

JP·1 granted patent·12 citations·filing 2001–2001

Technology mixC23C1 H10P1 Y10T1

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0160US6472299B2Method and apparatus for treating a substrate with hydrogen radicals at a temperature of less than 40 KYAMANASHI PREFECTURAL FEDERATI·Filed 2001·Granted Oct 29, 2002·12 cites·6 claims

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